Rainfall Model Using Principal Component Regression Analysis with R Software in Sulawesi
نویسندگان
چکیده
منابع مشابه
Principal Component Analysis using R
This tutorial is designed to give the reader a short overview of Principal Component Analysis (PCA) using R. PCA is a useful statistical method that has found application in a variety of fields and is a common technique for finding patterns in data of high dimension. Consider we are confronted with the following situation: The data, we want to work with, are in form of a matrix (xij)i=1...N,j=1...
متن کاملNonlinear Robust Regression Using Kernel Principal Component Analysis and R-Estimators
In recent years, many algorithms based on kernel principal component analysis (KPCA) have been proposed including kernel principal component regression (KPCR). KPCR can be viewed as a non-linearization of principal component regression (PCR) which uses the ordinary least squares (OLS) for estimating its regression coefficients. We use PCR to dispose the negative effects of multicollinearity in ...
متن کاملRobust Principal Component Regression
In this note we introduce a method for robust principal component regression. Robust principal components are computed from the predictor variables, and they are used afterwards for estimating a response variable by performing robust linear multiple regression. The performance of the method is evaluated at a test data set from geochemistry. Then it is used for the prediction of censored values ...
متن کاملPrincipal Component Analysis in Linear Regression Survival Model with Microarray Data
As a useful alternative to the Cox proportional hazards model, the linear regression survival model assumes a linear relationship between the covariates and a known monotone transformation, for example logarithm, of an event time of interest. In this article, we study the linear regression survival model with right censored survival data, when high-dimensional microarray measurements are presen...
متن کاملOptical Proximity Correction with Principal Component Regression
An important step in today’s Integrated Circuit (IC) manufacturing is optical proximity correction (OPC). In model based OPC, masks are systematically modified to compensate for the non-ideal optical and process effects of optical lithography system. The polygons in the layout are fragmented, and simulations are performed to determine the image intensity pattern on the wafer. Then the mask is p...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Desimal: Jurnal Matematika
سال: 2020
ISSN: 2613-9081,2613-9073
DOI: 10.24042/djm.v3i3.6108